Doping Engineering for Front-End Processing: Volume 1070 - Paperback
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Availability:In StockContributor:B. J. Pawlak, M. L. Pelaz, M. LawSeries:Mrs ProceedingsPublish date:2014-06-05Pages:336
Languages:EnglishPublisher:Cambridge University PressISBN-13:9781107408548ISBN-10:1107408547UPC:9781107408548Book Category:Technology & Engineering, ScienceBook Subcategory:Materials Science, Electronics, NanoscienceBook Topic:SemiconductorsSize:9.00 x 6.00 x 0.70 inchesWeight:0.99Product ID:SC7XQ69D9W
Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.
Languages:EnglishPublisher:Cambridge University PressISBN-13:9781107408548ISBN-10:1107408547UPC:9781107408548Book Category:Technology & Engineering, ScienceBook Subcategory:Materials Science, Electronics, NanoscienceBook Topic:SemiconductorsSize:9.00 x 6.00 x 0.70 inchesWeight:0.99Product ID:SC7XQ69D9W
Publisher: Cambridge University Press
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